Glass Wafer · TGV Substrates
Core Materials for Chip Packaging
From precision glass wafer processing to TGV substrates, SEMI-compliant and built for 5G/6G RF modules, AI packaging (CoWoS/HBM), and MEMS sensors — with one-stop optical coating included.
Three Size Options
SEMI Standard
Custom Sizes
Low-Loss Substrate
Glass Wafer · TGV Substrates
Core Materials for Chip Packaging
From precision glass wafer processing to TGV substrates, SEMI-compliant and built for 5G/6G RF modules, AI packaging (CoWoS/HBM), and MEMS sensors — with one-stop optical coating included.
Three Size Options
SEMI Standard
Custom Sizes
Low-Loss Substrate
Four Core Technology Services
From glass substrate processing to functional coatings, delivering complete solutions for the semiconductor and optoelectronics industries.
Glass Wafer Processing
Supplying 6", 8", and 12" precision glass wafers with TTV < 0.5μm (6") and surface roughness Ra < 0.3nm, fully compliant with SEMI semiconductor manufacturing standards.
TGV Glass Substrates
Through Glass Via technology with via diameters of 30–150μm and a dielectric constant < 6, suitable for 5G/6G RF front-ends, AI CoWoS/HBM packaging, and MEMS sensors.
Specialty Optical Glass
A wide range of specialty optical glass materials, including ultra-thin Carrier Glass support substrates, piezoelectric synthetic quartz, and Blue Glass IR-cut filters.
Optical Coating Services
One-stop functional coating services including anti-reflective (AR) coatings, ITO/FTO transparent conductive films, metal sputtering (Cr/Au/Al), and multilayer dielectric coatings.
Four Core Technology Services
From glass substrate processing to functional coatings, delivering complete solutions for the semiconductor and optoelectronics industries.
Glass Wafer Processing
Supplying 6", 8", and 12" precision glass wafers with TTV < 0.5μm (6") and surface roughness Ra < 0.3nm, fully compliant with SEMI semiconductor manufacturing standards.
TGV Glass Substrates
Through Glass Via technology with via diameters of 30–150μm and a dielectric constant < 6, suitable for 5G/6G RF front-ends, AI CoWoS/HBM packaging, and MEMS sensors.
Specialty Optical Glass
A wide range of specialty optical glass materials, including ultra-thin Carrier Glass support substrates, piezoelectric synthetic quartz, and Blue Glass IR-cut filters.
Optical Coating Services
One-stop functional coating services including anti-reflective (AR) coatings, ITO/FTO transparent conductive films, metal sputtering (Cr/Au/Al), and multilayer dielectric coatings.
TGV Glass Substrates
Next-Generation Packaging Interconnects
Through Glass Via (TGV) replaces traditional silicon substrates with low-loss glass, delivering superior electrical insulation, lower dielectric loss, and higher integration density. As demand surges for 5G mmWave, AI high-performance computing packaging, and MEMS sensors, TGV is becoming an essential material for advanced packaging.
- Via Diameter30 – 150 μm
- Via Pitch50 – 500 μm
- Substrate Thickness0.1 – 0.7 mm
- Dielectric Constant (1GHz)< 6
- Coefficient of Thermal Expansion (CTE)3 – 7 ppm/°C
- Key Applications5G/6G · AI Packaging · MEMS
TGV Glass Substrates
Next-Generation Packaging Interconnects
Through Glass Via (TGV) replaces traditional silicon substrates with low-loss glass, delivering superior electrical insulation, lower dielectric loss, and higher integration density. As demand surges for 5G mmWave, AI high-performance computing packaging, and MEMS sensors, TGV is becoming an essential material for advanced packaging.
- Via Diameter30 – 150 μm
- Via Pitch50 – 500 μm
- Substrate Thickness0.1 – 0.7 mm
- Dielectric Constant (1GHz)< 6
- Coefficient of Thermal Expansion (CTE)3 – 7 ppm/°C
- Key Applications5G/6G · AI Packaging · MEMS
Complete Specification Comparison
Covering full technical specifications for both glass wafer processing and TGV substrates, with customization available on request.
| Specification | 6" Glass Wafer | 8" Glass Wafer | 12" Glass Wafer |
|---|---|---|---|
| Wafer Diameter | 150 mm | 200 mm | 300 mm |
| TTV Precision | < 0.5 μm | < 0.8 μm | < 0.8 μm |
| Processable Thickness | 0.1 – 2.0 mm | ||
| Surface Roughness (Ra) | < 0.3 nm (polished surface) | ||
| Available Materials | Alkali-free borosilicate glass / Quartz glass / BK7 optical glass / Specialty optical glass | ||
| Compliant Standards | SEMI M1・M20・M78 | ||
| Specification | TGV Glass Substrate | Notes |
|---|---|---|
| Via Diameter | 30 – 150 μm | Customizable by application |
| Via Pitch | 50 – 500 μm | Smaller pitch achievable with high-density arrays |
| Substrate Thickness | 0.1 – 0.7 mm | Ultra-thin down to 100 μm |
| Dielectric Constant (1 GHz) | < 6 | Low-loss, outperforming organic substrates |
| Coefficient of Thermal Expansion (CTE) | 3 – 7 ppm/°C | Close to silicon's CTE, reducing warpage |
| Warpage Control | Ultra-low warpage design | Suitable for back-end thinning processes |
| Key Applications | 5G RF Modules · AI HBM Packaging · MEMS | — |
Complete Specification Comparison
Covering full technical specifications for both glass wafer processing and TGV substrates, with customization available on request.
| Specification | 6" Glass Wafer | 8" Glass Wafer | 12" Glass Wafer |
|---|---|---|---|
| Wafer Diameter | 150 mm | 200 mm | 300 mm |
| TTV Precision | < 0.5 μm | < 0.8 μm | < 0.8 μm |
| Processable Thickness | 0.1 – 2.0 mm | ||
| Surface Roughness (Ra) | < 0.3 nm (polished surface) | ||
| Available Materials | Alkali-free borosilicate glass / Quartz glass / BK7 optical glass / Specialty optical glass | ||
| Compliant Standards | SEMI M1・M20・M78 | ||
| Specification | TGV Glass Substrate | Notes |
|---|---|---|
| Via Diameter | 30 – 150 μm | Customizable by application |
| Via Pitch | 50 – 500 μm | Smaller pitch achievable with high-density arrays |
| Substrate Thickness | 0.1 – 0.7 mm | Ultra-thin down to 100 μm |
| Dielectric Constant (1 GHz) | < 6 | Low-loss, outperforming organic substrates |
| Coefficient of Thermal Expansion (CTE) | 3 – 7 ppm/°C | Close to silicon's CTE, reducing warpage |
| Warpage Control | Ultra-low warpage design | Suitable for back-end thinning processes |
| Key Applications | 5G RF Modules · AI HBM Packaging · MEMS | — |
Two Partnership Models
Choose the partnership model that best fits your application — from sample development to full-scale production, we support it all.
TGV Glass Substrates
Custom Development
Design development and volume supply of TGV substrates for high-end applications including 5G/6G RF modules, AI CoWoS/HBM packaging, and MEMS sensors.
- Fully customizable via diameters from 30–150μm
- Low-loss dielectric constant < 6
- Ultra-low warpage, thinnable down to 100μm
- Compatible with AI CoWoS / HBM packaging requirements
- SEMI-compliant, with complete documentation provided
Precision Glass Wafer
Contract Processing
One-stop processing for 6", 8", and 12" precision glass wafers — from dicing, grinding, and polishing to functional coatings — covering the full process chain for semiconductor and optoelectronic applications.
- Ultra-high precision, TTV < 0.5μm (6")
- Surface roughness Ra < 0.3 nm
- Multiple glass materials: alkali-free, quartz, BK7
- Integrated optical coatings (AR/ITO/metal sputtering)
- From small-batch samples to full-scale mass production
Two Partnership Models
Choose the partnership model that best fits your application — from sample development to full-scale production, we support it all.
TGV Glass Substrates
Custom Development
Design development and volume supply of TGV substrates for high-end applications including 5G/6G RF modules, AI CoWoS/HBM packaging, and MEMS sensors.
- Fully customizable via diameters from 30–150μm
- Low-loss dielectric constant < 6
- Ultra-low warpage, thinnable down to 100μm
- Compatible with AI CoWoS / HBM packaging requirements
- SEMI-compliant, with complete documentation provided
Precision Glass Wafer
Contract Processing
One-stop processing for 6", 8", and 12" precision glass wafers — from dicing, grinding, and polishing to functional coatings — covering the full process chain for semiconductor and optoelectronic applications.
- Ultra-high precision, TTV < 0.5μm (6")
- Surface roughness Ra < 0.3 nm
- Multiple glass materials: alkali-free, quartz, BK7
- Integrated optical coatings (AR/ITO/metal sputtering)
- From small-batch samples to full-scale mass production
Where It's Used
From advanced semiconductor packaging to precision optical instruments, supporting a wide range of high-tech manufacturing needs.
TGV substrates are used in 5G mmWave RF front-end modules (RFFE), CoWoS packaging for AI accelerators, and high-bandwidth memory (HBM), meeting the demands of high-density interconnects and low-loss transmission — a key material for AI computing infrastructure.
Precision glass wafers are widely used in MEMS pressure sensors, gyroscopes, camera lens optical components, medical diagnostic instruments, and aerospace sensing systems — maintaining high reliability even under extreme heat, pressure, and vibration.
Where It's Used
From advanced semiconductor packaging to precision optical instruments, supporting a wide range of high-tech manufacturing needs.
TGV substrates are used in 5G mmWave RF front-end modules (RFFE), CoWoS packaging for AI accelerators, and high-bandwidth memory (HBM), meeting the demands of high-density interconnects and low-loss transmission — a key material for AI computing infrastructure.
Precision glass wafers are widely used in MEMS pressure sensors, gyroscopes, camera lens optical components, medical diagnostic instruments, and aerospace sensing systems — maintaining high reliability even under extreme heat, pressure, and vibration.
Specialty Optical Glass Processing
Custom processing services for Carrier Glass, piezoelectric materials, Blue Glass, and a wide range of optical glass types.
Supports ultra-thin wafers (≤150μm) during thinning, coating, and etching processes to prevent breakage — cleanable and reusable afterward to reduce production costs.
| Specifications | |
|---|---|
| Available Sizes | 6" / 8" / 12" |
| Material | Fused Silica / BF33 |
| Thickness | 500μm – 775μm |
| TTV | ≤1μm (premium) / ≤2μm |
| Surface | DSP double-side polished, Ra ≤0.5nm |
| Heat Resistance | Fused Silica >1000°C |
Made from synthetic quartz and available in plano, plano-convex, and bi-convex cut forms, suitable for high-reliability applications in aerospace, telecom base stations, and satellites.
| Specifications | |
|---|---|
| Material | Synthetic Quartz |
| Size | φ4.5–φ14mm / 1.8×3–30×30mm |
| Frequency | 5MHz (O3) – 120MHz (O5) |
| Cut Type | Plano / Plano-convex / Bi-convex / Doubly rotated cut |
Blocks infrared light above 700nm to ensure accurate color reproduction on CMOS sensors, widely used in smartphone camera modules, automotive lenses, and security surveillance.
| Specifications | |
|---|---|
| Material | SCHOTT BG / CDGM QB / NEG |
| Size | 77×77mm (standard) |
| Thickness | 0.11 / 0.145 / 0.21 / 0.3mm |
| Cutoff Wavelength | >700nm IR blocking |
Precision cutting, grinding, and polishing services for optical glass from multiple leading brands, covering applications from camera lenses to medical instruments.
| Material | Application |
|---|---|
| SCHOTT B270 / D263T | High-transmission optics |
| JGS1 (Fused Silica) | UV optics |
| OHARA Series | Camera, medical |
| CORNING Eagle XG | TFT-LCD substrates |
Specialty Optical Glass Processing
Custom processing services for Carrier Glass, piezoelectric materials, Blue Glass, and a wide range of optical glass types.
Supports ultra-thin wafers (≤150μm) during thinning, coating, and etching processes to prevent breakage — cleanable and reusable afterward to reduce production costs.
| Specifications | |
|---|---|
| Available Sizes | 6" / 8" / 12" |
| Material | Fused Silica / BF33 |
| Thickness | 500μm – 775μm |
| TTV | ≤1μm (premium) / ≤2μm |
| Surface | DSP double-side polished, Ra ≤0.5nm |
| Heat Resistance | Fused Silica >1000°C |
Made from synthetic quartz and available in plano, plano-convex, and bi-convex cut forms, suitable for high-reliability applications in aerospace, telecom base stations, and satellites.
| Specifications | |
|---|---|
| Material | Synthetic Quartz |
| Size | φ4.5–φ14mm / 1.8×3–30×30mm |
| Frequency | 5MHz (O3) – 120MHz (O5) |
| Cut Type | Plano / Plano-convex / Bi-convex / Doubly rotated cut |
Blocks infrared light above 700nm to ensure accurate color reproduction on CMOS sensors, widely used in smartphone camera modules, automotive lenses, and security surveillance.
| Specifications | |
|---|---|
| Material | SCHOTT BG / CDGM QB / NEG |
| Size | 77×77mm (standard) |
| Thickness | 0.11 / 0.145 / 0.21 / 0.3mm |
| Cutoff Wavelength | >700nm IR blocking |
Precision cutting, grinding, and polishing services for optical glass from multiple leading brands, covering applications from camera lenses to medical instruments.
| Material | Application |
|---|---|
| SCHOTT B270 / D263T | High-transmission optics |
| JGS1 (Fused Silica) | UV optics |
| OHARA Series | Camera, medical |
| CORNING Eagle XG | TFT-LCD substrates |
Quality Inspection Equipment
Equipped with professional optical measurement instruments to ensure every glass substrate meets the strictest quality standards in the semiconductor and optics industries.
Quality Inspection Equipment
Equipped with professional optical measurement instruments to ensure every glass substrate meets the strictest quality standards in the semiconductor and optics industries.
Optical Coating Services
A range of coating processes tailored to functional needs, comprehensively enhancing the optical and electrical performance of glass substrates.
Anti-Reflective Coating (AR Coating)
Reduces surface reflectance to < 0.5%, significantly boosting light transmission — used in camera lenses, sensor windows, and display protective glass.
ITO / FTO Transparent Conductive Coating
Transparent conductive oxide films with adjustable sheet resistance from 10–200 Ω/□, used in touch panels, solar cells, and electrically heated defogging glass.
Metal Sputtering (Cr / Au / Al)
High-adhesion metal films for electrode layers, masking layers, or heat-dissipation layers, widely used in MEMS microfabrication and semiconductor wafer processes.
Dielectric Multilayer Coatings
Alternating stacks of high- and low-refractive-index materials produce precision optical components such as bandpass filters, high-reflectivity mirrors, and beam splitters, with customizable wavelength ranges.
Optical Coating Services
A range of coating processes tailored to functional needs, comprehensively enhancing the optical and electrical performance of glass substrates.
Anti-Reflective Coating (AR Coating)
Reduces surface reflectance to < 0.5%, significantly boosting light transmission — used in camera lenses, sensor windows, and display protective glass.
ITO / FTO Transparent Conductive Coating
Transparent conductive oxide films with adjustable sheet resistance from 10–200 Ω/□, used in touch panels, solar cells, and electrically heated defogging glass.
Metal Sputtering (Cr / Au / Al)
High-adhesion metal films for electrode layers, masking layers, or heat-dissipation layers, widely used in MEMS microfabrication and semiconductor wafer processes.
Dielectric Multilayer Coatings
Alternating stacks of high- and low-refractive-index materials produce precision optical components such as bandpass filters, high-reflectivity mirrors, and beam splitters, with customizable wavelength ranges.
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